• DocumentCode
    51544
  • Title

    Characterization of Insertion Loss and Back Reflection in Passive Hybrid Silicon Tapers

  • Author

    Kurczveil, G. ; Pintus, P. ; Heck, Martijn J. R. ; Peters, J.D. ; Bowers, John E.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of California, Santa Barbara, Santa Barbara, CA, USA
  • Volume
    5
  • Issue
    2
  • fYear
    2013
  • fDate
    Apr-13
  • Firstpage
    6600410
  • Lastpage
    6600410
  • Abstract
    The optical properties of two hybrid silicon taper designs are investigated. These tapers convert the optical mode from a silicon waveguide to a hybrid silicon III/V waveguide. A passive chip was fabricated with an epitaxial layer similar to those used in hybrid silicon lasers. To separate optical scattering and mode mismatch from quantum-well absorption, the active layer in this paper was designed to be at 1410 nm, to allow measurements at 1550 nm. Using cutback structures, the taper loss and the taper reflection are quantified. Taper losses between 0.2 and 0.6 dB per taper and reflections below -41 dB are measured.
  • Keywords
    III-V semiconductors; elemental semiconductors; light reflection; optical design techniques; optical fabrication; optical losses; optical waveguides; silicon; Si; back reflection; hybrid silicon III-V waveguide; insertion loss; mode mismatch; optical scattering mode; passive chip; passive hybrid silicon tapers; quantum-well absorption; silicon waveguide; taper loss; taper reflection; wavelength 1410 nm; wavelength 1550 nm; Insertion loss; Loss measurement; Optical device fabrication; Optical losses; Optical waveguides; Reflection; Silicon; Optoelectronics; optical amplifiers; photonic integrated circuits; semiconductor lasers;
  • fLanguage
    English
  • Journal_Title
    Photonics Journal, IEEE
  • Publisher
    ieee
  • ISSN
    1943-0655
  • Type

    jour

  • DOI
    10.1109/JPHOT.2013.2246559
  • Filename
    6459515