DocumentCode
51544
Title
Characterization of Insertion Loss and Back Reflection in Passive Hybrid Silicon Tapers
Author
Kurczveil, G. ; Pintus, P. ; Heck, Martijn J. R. ; Peters, J.D. ; Bowers, John E.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of California, Santa Barbara, Santa Barbara, CA, USA
Volume
5
Issue
2
fYear
2013
fDate
Apr-13
Firstpage
6600410
Lastpage
6600410
Abstract
The optical properties of two hybrid silicon taper designs are investigated. These tapers convert the optical mode from a silicon waveguide to a hybrid silicon III/V waveguide. A passive chip was fabricated with an epitaxial layer similar to those used in hybrid silicon lasers. To separate optical scattering and mode mismatch from quantum-well absorption, the active layer in this paper was designed to be at 1410 nm, to allow measurements at 1550 nm. Using cutback structures, the taper loss and the taper reflection are quantified. Taper losses between 0.2 and 0.6 dB per taper and reflections below -41 dB are measured.
Keywords
III-V semiconductors; elemental semiconductors; light reflection; optical design techniques; optical fabrication; optical losses; optical waveguides; silicon; Si; back reflection; hybrid silicon III-V waveguide; insertion loss; mode mismatch; optical scattering mode; passive chip; passive hybrid silicon tapers; quantum-well absorption; silicon waveguide; taper loss; taper reflection; wavelength 1410 nm; wavelength 1550 nm; Insertion loss; Loss measurement; Optical device fabrication; Optical losses; Optical waveguides; Reflection; Silicon; Optoelectronics; optical amplifiers; photonic integrated circuits; semiconductor lasers;
fLanguage
English
Journal_Title
Photonics Journal, IEEE
Publisher
ieee
ISSN
1943-0655
Type
jour
DOI
10.1109/JPHOT.2013.2246559
Filename
6459515
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