• DocumentCode
    516765
  • Title

    CMOS/SIMOX-RF-Frontend for 1.7GHz

  • Author

    Eggert, D. ; Budde, W.

  • Author_Institution
    Fraunhofer-Institute of Microelectronic Circuits and Systems, IMS-2 Dresden, Grenzstr. 28; D-01109 Dresden
  • fYear
    1996
  • fDate
    17-19 Sept. 1996
  • Firstpage
    208
  • Lastpage
    211
  • Abstract
    The cointegration of high-speed NMOS devices and inductive elements by means of a SIMOX-technology with high-resistive substrates enables operating frequencies which meet the needs of modern communication systems. This paper describes a RF frontend operating in the frequency range 1.4 to 1.9GHz. The performance of the presented circuit proves the capability of this technology to realize complete RF-systems on a single chip.
  • Keywords
    CMOS technology; Capacitors; Circuits; Dielectric substrates; Dielectric thin films; Impedance matching; Inductors; Radio frequency; Silicon on insulator technology; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference, 1996. ESSCIRC '96. Proceedings of the 22nd European
  • Conference_Location
    Neuchatel, Switzerland
  • Print_ISBN
    2-86332-197-8
  • Type

    conf

  • Filename
    5468628