Title :
Extraordinary low transmission of a metamaterial for application in lithography
Author :
Dobmann, S. ; Ploss, D. ; Reibold, D. ; Erdmann, A. ; Peschel, U.
Author_Institution :
Max Planck Inst. for the Sci. of Light, Erlangen, Germany
Abstract :
We present experiments on a metamaterial made from an ultrathin (< 40 nm) metal film. It exhibits extraordinary low transmission due to an antenna resonance and may form building blocks of future lithographic masks.
Keywords :
Antenna measurements; Lithography; Metamaterials; Optical films; Optical polarization; Plasmons; Resonance; Scanning electron microscopy; Transmitting antennas; Wavelength measurement;
Conference_Titel :
Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
Conference_Location :
San Jose, CA, USA
Print_ISBN :
978-1-55752-890-2
Electronic_ISBN :
978-1-55752-890-2
