• DocumentCode
    521428
  • Title

    Reducing Si reflectance by improving density and uniformity of Si nanowires fabricated by metal-assisted etching

  • Author

    Shiu, Shu-Chia ; Lin, Shin-Bo ; Lin, Ching-Fuh

  • Author_Institution
    Grad. Inst. of Photonics & Optoelectron., Nat. Taiwan Univ., Taipei, Taiwan
  • fYear
    2010
  • fDate
    16-21 May 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    A silicon surface treatment before metal-assisted etching increases the density of silicon nanowires. The improvement reduces the solar-weighted reflectance to as low as 3.3% for silicon nanowires with a length of only 0.87µm.
  • Keywords
    Etching; Light scattering; Nanowires; Optical reflection; Photovoltaic systems; Reflectivity; Silicon; Solar power generation; Surface morphology; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
  • Conference_Location
    San Jose, CA, USA
  • Print_ISBN
    978-1-55752-890-2
  • Electronic_ISBN
    978-1-55752-890-2
  • Type

    conf

  • Filename
    5501048
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=521428