Title :
Reducing Si reflectance by improving density and uniformity of Si nanowires fabricated by metal-assisted etching
Author :
Shiu, Shu-Chia ; Lin, Shin-Bo ; Lin, Ching-Fuh
Author_Institution :
Grad. Inst. of Photonics & Optoelectron., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
A silicon surface treatment before metal-assisted etching increases the density of silicon nanowires. The improvement reduces the solar-weighted reflectance to as low as 3.3% for silicon nanowires with a length of only 0.87µm.
Keywords :
Etching; Light scattering; Nanowires; Optical reflection; Photovoltaic systems; Reflectivity; Silicon; Solar power generation; Surface morphology; Surface treatment;
Conference_Titel :
Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
Conference_Location :
San Jose, CA, USA
Print_ISBN :
978-1-55752-890-2
Electronic_ISBN :
978-1-55752-890-2
