• DocumentCode
    521645
  • Title

    Obtaining the Wavefront Aberrations of Passive Positive-Branch Unstable Resonators by Use of H-S Sensor

  • Author

    Zhang, Xiang

  • Author_Institution
    Dept. of Optoelectron. Technol., ChengDu Univ. of Inf. Technol., Chengdu, China
  • fYear
    2010
  • fDate
    19-21 June 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The effect of intracavity aberrated perturbation on output mode structure properties of passive confocal unstable resonator is been experimentally researched by adopting Hartmann-Shack (H-S) wavefront sensor and Zernike modal wavefront reconstruction on the basis of numerical simulation. The results show that intracavity tilt perturbation notablely affects outcoupled intensity distribution, and will also increase some high-order aberrations of beam phase properties. However, low-order Zernike tilt aberration is the main component when phase-tilted perturbation is introduced into the resonator. Defocus, astigmatism and coma aberration will all be brought, and also such high-order aberration included in wavefront will directly degrade output beam quality. When adaptive optical elements such as deformable mirrors are adopted for intracavity aberration correction, the correction of tilt aberration should be considered firstly.
  • Keywords
    aberrations; laser beams; laser cavity resonators; mirrors; wavefront sensors; Hartmann-Shack wavefront sensor; Zernike modal wavefront reconstruction; beam phase properties; coma aberration; deformable mirrors; intracavity aberrated perturbation; intracavity tilt perturbation; numerical simulation; outcoupled intensity distribution; output beam quality; passive positive-branch unstable resonators; phase-tilted perturbation; wavefront aberrations; Information technology; Integral equations; Laser beams; Laser modes; Mirrors; Numerical simulation; Optical resonators; Optoelectronic and photonic sensors; Oscillators; Vision defects;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics and Optoelectronic (SOPO), 2010 Symposium on
  • Conference_Location
    Chengdu
  • Print_ISBN
    978-1-4244-4963-7
  • Electronic_ISBN
    978-1-4244-4964-4
  • Type

    conf

  • DOI
    10.1109/SOPO.2010.5504259
  • Filename
    5504259