Title :
The study of resolution of X-ray digital imaging system based on the double proximity focusing X-ray image intensifier
Author :
Li Wei ; Qing, Hau
Author_Institution :
Sch. of Inf. Eng., Chang´´an Univ., Xi´´an, China
Abstract :
To the X-ray imaging system, resolution is one of the significant parameters to measure the imaging quality. In order to develop a high-resolution X-ray digital imaging system used for electronic industry, our laboratory has worked out the systemic resolution mathematical model of the X-ray imaging system. In this model, several factors are considered, such as the size of focus of the X-ray source, the double proximity focusing X-ray image intensifier and the influence of CMOS camera. Tests show the model accords with the truth. So it would have some value to the design of the similar systems.
Keywords :
Digital images; Electronics industry; Focusing; High-resolution imaging; Image intensifiers; Image resolution; Laboratories; Optical imaging; Semiconductor device modeling; X-ray imaging; CMOS camera; MicroFocus X-ray source; Resolution; The double proximity focusing X-ray image intensifier;
Conference_Titel :
Optics Photonics and Energy Engineering (OPEE), 2010 International Conference on
Conference_Location :
Wuhan, China
Print_ISBN :
978-1-4244-5234-7
Electronic_ISBN :
978-1-4244-5236-1
DOI :
10.1109/OPEE.2010.5508135