DocumentCode
525201
Title
Study on the flow next to the membrane wall in air gap membrane distillation hot-cavity by PIV
Author
Chen, Yongyan ; Tian, Rui ; Gao, Zhiying ; Chen, Liwen
Author_Institution
Sch. of Energy & Power Eng., Inner Mongolia Univ. of Technol., Hohhot, China
Volume
1
fYear
2010
fDate
25-27 June 2010
Abstract
The paper provides the experimental data and an application reference for designing high-performance air-gap membrane distillation system. Using the Particle Image Velocimetry (PIV) technology, this paper is to study the flow mechanism of rotary tangential inflow through capturing different parameters of inlet nozzle´s installation angles and gaps between the membrane and the nozzle like duck-mouth. The paper indicates that the positive correlation between the inlet nozzle scouring velocity and the fluid of the membrane flow on the hot side: the higher velocity on the membrane wall, the faster the fluid. When there is more fluid going through the membrane wall and, at the same time, the membrane wall has more heat and water molecules to destroy temperaturepolarization and concentration-polarization, the membrane flux increases accordingly. The inlet nozzle scouring area and the area of high membrane flux in membrane wall have the positive correlation, too. The experiment results show when hot-cavity parameters is δ=5mm, β=40°, it achieves the maximum scouring velocity and scouring area.
Keywords
cavitation; distillation; flow separation; membranes; nozzles; polarisation; rotational flow; velocimeters; PIV technology; air-gap membrane distillation system; concentration polarization; hot cavitation; membrane flux; membrane wall flow; nozzle scouring velocity; particle image velocimetry; rotary tangential inflow; temperature polarization; Biomembranes; Computer vision; Data mining; Mobile robots; Object detection; Orbital robotics; Robot localization; Robot sensing systems; Simultaneous localization and mapping; Testing; PIV; air-gap membrane distillation; flow; hot cavity;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer Design and Applications (ICCDA), 2010 International Conference on
Conference_Location
Qinhuangdao
Print_ISBN
978-1-4244-7164-5
Electronic_ISBN
978-1-4244-7164-5
Type
conf
DOI
10.1109/ICCDA.2010.5540821
Filename
5540821
Link To Document