DocumentCode
525867
Title
0.13μm CMOS/DMOS platform technology with novel 8V/9V LDMOS for low voltage high-frequency DC-DC converters
Author
Matsudai, Tomoko ; Sato, Kumiko ; Yasuhara, Norio ; Saito, Hiroshi ; Endo, Koichi ; Takeuchi, Fumio ; Yamamoto, Masaaki
Author_Institution
Discrete Semicond. Div., Toshiba Corp., Kawasaki, Japan
fYear
2010
fDate
6-10 June 2010
Firstpage
315
Lastpage
318
Abstract
This paper presents a novel low voltage LDMOS structure with low on-resistance based on 0.13 μm CMOS technology. 8 V/9 V Nch LDMOS have only 0.3 μm gate length when the maximum gate operating voltage is 5 V, while the gate length of 5 V CMOS is 0.6 μm to avoid the short channel effect. The obtained specific on-resistance are 1.8 mΩmm2 (8 V Nch LDMOS) and 5.9 mΩmm2 (8 V Pch LDMOS) respectively. Furthermore ESD protection structure for 8V LDMOS without any additional mask is also fabricated with large second breakdown trigger current It2 in spite of the same device size.
Keywords
CMOS integrated circuits; DC-DC power convertors; frequency convertors; CMOS-DMOS platform technology; ESD protection structure; low voltage LDMOS structure; low voltage high-frequency DC-DC converters; mask; maximum gate operating voltage; short channel effect; size 0.13 mum; size 0.6 mum; specific on-resistance; voltage 5 V; voltage 8 V; voltage 9 V; CMOS process; CMOS technology; DC-DC power converters; Electric breakdown; Electrodes; Electrostatic discharge; Low voltage; Power integrated circuits; Power semiconductor devices; Protection;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices & IC's (ISPSD), 2010 22nd International Symposium on
Conference_Location
Hiroshima
ISSN
1943-653X
Print_ISBN
978-1-4244-7718-0
Electronic_ISBN
1943-653X
Type
conf
Filename
5543892
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