DocumentCode
525902
Title
Power MOSFET operation at cryogenic temperatures: Comparison between HEXFET®, MDMeshTM and CoolMOSTM
Author
Leong, K.K. ; Bryant, A.T. ; Mawby, P.A.
Author_Institution
Sch. of Eng., Univ. of Warwick, Coventry, UK
fYear
2010
fDate
6-10 June 2010
Firstpage
209
Lastpage
212
Abstract
Previous studies have measured conventional power MOSFET [1] and IGBT [2] operation down to the temperature of 4.2K. However, super-junction (SJ) devices such as CoolMOS™ have only been characterised down to 80K. This paper presents the cryogenic behaviour of HEXFET®, MDMesh™ and CoolMOS™ down to the temperature of 20K for the first time. A linear reduction in breakdown voltage with temperature was observed down to approximately 150K, below which the breakdown voltages saturated at higher values than predicted. The gradient of the linear reduction and the temperature at which the saturation begins depend on the dopant concentration of the drift region and on the device structure. The on-state resistances were found to reduce dramatically down to 50K; below this temperature, some SJ devices exhibited significant carrier freeze-out effects while conventional devices like HEXFET® were less affected.
Keywords
cryogenic electronics; electric breakdown; insulated gate bipolar transistors; power MOSFET; IGBT; breakdown voltage; cryogenic temperatures; power MOSFET operation; Cryogenics; Electrical resistance measurement; Lakes; MOSFET circuits; Power MOSFET; Power measurement; Substrates; Temperature control; Temperature measurement; Temperature sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices & IC's (ISPSD), 2010 22nd International Symposium on
Conference_Location
Hiroshima
ISSN
1943-653X
Print_ISBN
978-1-4244-7718-0
Electronic_ISBN
1943-653X
Type
conf
Filename
5543997
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