DocumentCode :
530900
Title :
Dependence of FET/HEMT reliability on substrate thickness and gate length
Author :
Darwish, Ali M. ; Hung, H. Alfred
Author_Institution :
RF Electron. Dept., Army Res. Lab., Adelphi, MD, USA
fYear :
2010
fDate :
27-28 Sept. 2010
Firstpage :
262
Lastpage :
265
Abstract :
The transistor substrate has a significant role on RF losses, device heating, and reliability. The substrate thickness, and the gate length, among other parameters, have direct implications on the transistor lifetime. This paper presents an analytical expression relating the reliability to gate length and to substrate thickness for a field effect transistor (FET), or a high electron mobility transistor (HEMT), based on thermal considerations. Experimental observations support the model´s predicted results. The derived methodology and analytical expressions are useful for device/MMIC designers to assess the device/circuit reliability performance.
Keywords :
field effect MMIC; high electron mobility transistors; semiconductor device reliability; FET-HEMT reliability; MMIC designers; RF losses; device heating; field effect transistor; gate length; high electron mobility transistor; substrate thickness; thermal considerations; transistor lifetime; transistor substrate; Gallium arsenide; Logic gates; Reliability; Sensitivity; Silicon; Substrates; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Integrated Circuits Conference (EuMIC), 2010 European
Conference_Location :
Paris
Print_ISBN :
978-1-4244-7231-4
Type :
conf
Filename :
5613674
Link To Document :
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