DocumentCode :
534020
Title :
Investigation of variants of power supply schemes for microwave magnetron average power for plasma processing of materials
Author :
Madveyko, S.I.
Author_Institution :
Belarusian State Univ. of Inf. & Radioelectron., Minsk, Belarus
fYear :
2010
fDate :
13-17 Sept. 2010
Firstpage :
1099
Lastpage :
1100
Abstract :
The results of experimental research of plasma radiation optical signal depending on the pressure in the plasmatron chamber, using the different electrical networks of microwave magnetron power supply, are presented.
Keywords :
magnetrons; microwave power transmission; optical signal detection; plasma diodes; plasma materials processing; electrical network; microwave magnetron average power; microwave magnetron power supply; plasma processing; plasma radiation optical signal; plasmatron chamber; Luminescence; Optical pulses; Optical saturation; Plasmas; Power supplies; Saturation magnetization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Telecommunication Technology (CriMiCo), 2010 20th International Crimean Conference
Conference_Location :
Sevastopol
Print_ISBN :
978-1-4244-7184-3
Type :
conf
DOI :
10.1109/CRMICO.2010.5632840
Filename :
5632840
Link To Document :
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