• DocumentCode
    534308
  • Title

    Simultaneous topographic and thermal imaging of silicon nanowires using a new SThM probe

  • Author

    Puyoo, Etienne ; Grauby, Stéphane ; Rampnoux, Jean-Michel ; Claeys, Wilfrid ; Rouvière, Emmanuelle ; Dilhaire, Stefan

  • Author_Institution
    CPMOH, Univ. Bordeaux 1, Talence, France
  • fYear
    2010
  • fDate
    6-8 Oct. 2010
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    In Scanning Thermal Microscopy (SThM) techniques, the probe, and more particularly the tip, plays a major role in the spatial resolution limitation and in the acquisition speed. We present a new commercial resistive SThM probe constituted of a Palladium (Pd) film on a SiO2 substrate. We first describe its geometry and electrical properties. Then, we present topographic and thermal images of silicon nanowires, which show the very good spatial resolution (<;100nm) and the high acquisition speed obtained with this probe. To extract thermal parameters from a thermal image, a calibration of the probe is necessary. Hence, we propose a model for the probe and we finally use it to identify its geometric, electrical and thermal parameters.
  • Keywords
    elemental semiconductors; infrared imaging; nanowires; palladium; probes; silicon compounds; Pd; SiO2; acquisition speed; commercial resistive SThM probe; electrical parameters; electrical properties; geometric parameters; palladium film; scanning thermal microscopy techniques; silicon nanowires; spatial resolution limitation; thermal image; thermal imaging; thermal parameters; topographic imaging; Heating; Nanowires; Probes; Resistance; Spatial resolution; Temperature measurement; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermal Investigations of ICs and Systems (THERMINIC), 2010 16th International Workshop on
  • Conference_Location
    Barcelona
  • Print_ISBN
    978-1-4244-8453-9
  • Type

    conf

  • Filename
    5636303