DocumentCode
539435
Title
EES data analysis of lithography trouble detected by MapSSA
Author
Matsushita, H. ; Iyama, A. ; Miyashige, H. ; Nakagawa, S. ; Hatano, M. ; Kakinuma, H.
Author_Institution
Toshiba Corporation, Semiconductor Company, 8, Shinsugita-Cho, Isogo-Ku, Yokohama, 235-8522, Japan
fYear
2008
fDate
27-29 Oct. 2008
Firstpage
382
Lastpage
385
Abstract
We performed automatic classification of wafer test maps and analyzed data for machines with trouble. We detected patterns that had periodicity in the fail chip distribution and performed the machine difference analysis. If the lithography process is the origin of the periodicity pattern, we classify it as a shot failure. We analyzed the machine data and specified the root cause of the shot failure. This method is very effective for specifying the apparatus with trouble.
Keywords
Arrays; Calibration; Classification algorithms; Lithography; Monitoring; Principal component analysis; Probes;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location
Tokyo, Japan
ISSN
1523-553X
Electronic_ISBN
1523-553X
Type
conf
Filename
5714957
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