DocumentCode :
540481
Title :
A miniaturized transmission line with a mesh-structure signal metal for CMOS ICs
Author :
Ono, Naoko ; Mitomo, Toshiya ; Hoshino, Hiroaki ; Watanabe, Osamu
Author_Institution :
Wireless Syst. Lab., Toshiba Corp., Kawasaki, Japan
fYear :
2010
fDate :
7-10 Dec. 2010
Firstpage :
598
Lastpage :
601
Abstract :
A transmission line, which has a mesh-structure signal metal, is presented in this work for standard CMOS processes. It is desirable for a transmission line in a CMOS IC to be small in size and have low insertion loss. We propose a novel transmission line with large phase constant so that the circuit element using the proposed line can be constructed with a small area. This paper explains the proposed transmission line structure using mesh-structure signal metal and presents experimental results. This paper also describes a suitable type of transmission line for millimeter-wave CMOS IC. With the proposed transmission line, the element size can be reduced by 8.2% compared with that of the conventional one.
Keywords :
CMOS integrated circuits; millimetre wave integrated circuits; insertion loss; mesh-structure signal metal; millimeter-wave CMOS IC; miniaturized transmission line; phase constant; CMOS integrated circuits; CMOS process; Length measurement; Loss measurement; Metals; CMOS; coplanar waveguide; mesh-structure signal metal; millimeter-wave; transmission line;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference Proceedings (APMC), 2010 Asia-Pacific
Conference_Location :
Yokohama
Print_ISBN :
978-1-4244-7590-2
Electronic_ISBN :
978-1-902339-22-2
Type :
conf
Filename :
5728362
Link To Document :
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