DocumentCode
54146
Title
Capacitance/Conductance–Voltage–Frequency Characteristics of
Structures in Wide Frequency Range
Author
Kaya, Ahmet ; Tecimer, Huseyin ; Vural, Ozkan ; Tasdemir, Ibrahim Hudai ; Altindal, S.
Author_Institution
Dept. of Opticianry Vocational, Turgut Ozal Univ., Ankara, Turkey
Volume
61
Issue
2
fYear
2014
fDate
Feb. 2014
Firstpage
584
Lastpage
590
Abstract
The energy dependence of the interface states (Nss) and relaxation time (τ) and capture cross section (σp) of Nss in (Au/PVC+TCNQ/p-Si) heterojunction were investigated using high-low frequency capacitance (CHF-CLF) and conductance method, which contains many capacitance/conductance [C/(G/ω)-V] plots. The C value of the heterojunction increases with decreasing frequency as almost exponentially due to the existence of Nss between metal and semiconductor. The Nss and τ values have been obtained in the (0.053- Ev)-(0.785- Ev)-eV energy range by considering the voltage-dependent surface potential obtained from the lowest measurable frequency C-V curve at 1 kHz. The magnitude of Nss ranges from 3.88×1012 eV-1cm-2 to 3.24×1012 eV-1cm-2. In the same energy range, the value of τ ranges from 5.73×10-5 to 1.58×10-4 s and shows almost an exponential increase with increasing bias from the top of the valence band edge toward the midgap of semiconductor. The obtained Nss values from CHF-CLF and conductance methods are in good agreement with each other for the heterojunction. As a result, the mean value of Nss was found on the order of 1012 eV-1cm-2 and this value is very suitable for an electronic device.
Keywords
carrier relaxation time; gold; interface states; organic semiconductors; silicon; valence bands; Au-PVC-TCNQ-p-Si structures; C-V curve; capacitance-conductance-voltage-frequency characteristics; capture cross section; conductance methods; electronic device; frequency 1 kHz; heterojunction; high-low frequency capacitance method; interface states; relaxation time; valence band; voltage-dependent surface potential; wide frequency range; Capacitance; Frequency measurement; Gold; Heterojunctions; Semiconductor device measurement; Silicon; Temperature measurement; Inorganic compounds; interface states; organic materials; semiconductor–metal interface;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2013.2296037
Filename
6705692
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