DocumentCode
54650
Title
Frequency-Modulated Charge Pumping With Extremely High Gate Leakage
Author
Ryan, Jason Thomas ; Jibin Zou ; Southwick, Richard ; Campbell, Jason Paul ; Cheung, Kin P. ; Oates, Anthony S. ; Ru Huang
Author_Institution
Semicond. & Dimensional Metrol. Div., Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Volume
62
Issue
3
fYear
2015
fDate
Mar-15
Firstpage
769
Lastpage
775
Abstract
Charge pumping (CP) has proved itself to be one of the most utilitarian methods to quantify defects in MOS devices. In the presence of low-to-moderate gate leakage, CP quantification is most often implemented via a series of measurements at multiple frequencies. However, this approach is ill-equipped to handle excessive leakage currents common in advanced technologies. In this paper, we transform multifrequency CP from a quasi-dc measurement into a true ac measurement. This ac detection scheme, called frequency-modulated CP, is far better equipped to deal with high levels of leakage currents and thereby extends the usefulness of CP to current and future device technologies where excessive leakage is the norm. Additionally, we show that multifrequency CP has a long overlooked error that becomes significant in high-leakage situations. We discuss the origins of this error in detail and outline mitigation methodologies. Finally, we explore timing and voltage limitations of waveform generators and how these experimental boundary conditions impact on both frequency-dependent and FMCP.
Keywords
charge pump circuits; leakage currents; waveform generators; FMCP; MOS devices; ac detection scheme; detail mitigation methodologies; extremely high gate leakage; frequency-modulated CP; frequency-modulated charge pumping; leakage currents; multifrequency CP; outline mitigation methodologies; quasi-dc measurement; timing limitations; true ac measurement; utilitarian methods; voltage limitations; waveform generators; Frequency modulation; Iterative closest point algorithm; Leakage currents; Logic gates; Shape; Time-frequency analysis; Charge pumping (CP); defects; leakage current; leakage current.;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2015.2395956
Filename
7031954
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