DocumentCode :
54650
Title :
Frequency-Modulated Charge Pumping With Extremely High Gate Leakage
Author :
Ryan, Jason Thomas ; Jibin Zou ; Southwick, Richard ; Campbell, Jason Paul ; Cheung, Kin P. ; Oates, Anthony S. ; Ru Huang
Author_Institution :
Semicond. & Dimensional Metrol. Div., Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Volume :
62
Issue :
3
fYear :
2015
fDate :
Mar-15
Firstpage :
769
Lastpage :
775
Abstract :
Charge pumping (CP) has proved itself to be one of the most utilitarian methods to quantify defects in MOS devices. In the presence of low-to-moderate gate leakage, CP quantification is most often implemented via a series of measurements at multiple frequencies. However, this approach is ill-equipped to handle excessive leakage currents common in advanced technologies. In this paper, we transform multifrequency CP from a quasi-dc measurement into a true ac measurement. This ac detection scheme, called frequency-modulated CP, is far better equipped to deal with high levels of leakage currents and thereby extends the usefulness of CP to current and future device technologies where excessive leakage is the norm. Additionally, we show that multifrequency CP has a long overlooked error that becomes significant in high-leakage situations. We discuss the origins of this error in detail and outline mitigation methodologies. Finally, we explore timing and voltage limitations of waveform generators and how these experimental boundary conditions impact on both frequency-dependent and FMCP.
Keywords :
charge pump circuits; leakage currents; waveform generators; FMCP; MOS devices; ac detection scheme; detail mitigation methodologies; extremely high gate leakage; frequency-modulated CP; frequency-modulated charge pumping; leakage currents; multifrequency CP; outline mitigation methodologies; quasi-dc measurement; timing limitations; true ac measurement; utilitarian methods; voltage limitations; waveform generators; Frequency modulation; Iterative closest point algorithm; Leakage currents; Logic gates; Shape; Time-frequency analysis; Charge pumping (CP); defects; leakage current; leakage current.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2395956
Filename :
7031954
Link To Document :
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