• DocumentCode
    549289
  • Title

    Influence of self-heating on the impact-ionization gate leakage in AlInAs/InGaAs/InP HEMTs

  • Author

    Scavennec, André ; Maher, Hassan ; Decobert, Jean

  • Author_Institution
    Apecofi, Paris, France
  • fYear
    2011
  • fDate
    22-26 May 2011
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Excess gate leakage in AlInAs/InGaAs/InP HEMTs, resulting in a hump-shape superimposed to the conventional reverse current characteristics has been documented as originating from holes created by impact ionization in the channel. In some instances an anomalous behaviour has been reported with the appearance of double-hump Ig (Vgs) characteristics: while a first gate current hump appears close to pinch-off, a second hump shows up in open channel conditions, at higher drain voltages. In this paper, we show this feature of the gate leakage can be ascribed to the device self-heating, and the open-channel hump can be used to monitor the channel temperature.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; impact ionisation; indium compounds; AlInAs-InGaAs-InP; HEMT; double-hump characteristics; drain voltage; gate current; impact-ionization gate leakage; open channel conditions; reverse current characteristics; self-heating; HEMTs; Impact ionization; Indium gallium arsenide; Indium phosphide; Leakage current; Logic gates; MODFETs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials
  • Conference_Location
    Berlin
  • Print_ISBN
    978-1-4577-1753-6
  • Electronic_ISBN
    978-3-8007-3356-9
  • Type

    conf

  • Filename
    5978284