• DocumentCode
    549315
  • Title

    Analysis of in situ reflectance spectra and performance of InGaAs/GaAsP quantum-well solar cells: Towards a comprehensive understanding of strain accumulation influence on solar cell properties

  • Author

    Wang, Yunpeng ; Wen, Yu ; Sugryama, Masakazu ; Nakano, Yoshiaki

  • Author_Institution
    Res. Center for Adv. Sci. & Technol., Univ. of Tokyo, Tokyo, Japan
  • fYear
    2011
  • fDate
    22-26 May 2011
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    A strain-balanced InGaAs/GaAsP multiple quantum-wells (MQWs) structure was grown with metal organic vapor phase epitaxy (MOVPE) on GaAs substrate towards enhanced current gain by extending adsortion range. In our previous investigation, it has been verified that growth of such a hetero-structure can be diagnosed by periodical oscillation of transient reflectance spectra: an excess amount of strian accumulation (SA) would derive lattice relaxation in MQWs and degrades surface mophology, resulting in a decay in surface reflectance. In this report, we applied a series of detailed in situ monitoring of transient reflectance spectra (RS). According to a combined analysis of transient RS in a course of p-i-n MQWs solar cell growth and spectral response measurement, a comprehensive understanding can be offered to explain SA process through the whole p-i-n hetero-layer, and its influence on solar cell properties.
  • Keywords
    III-V semiconductors; MOCVD; gallium arsenide; indium compounds; p-i-n diodes; quantum well devices; semiconductor quantum wells; solar cells; surface morphology; vapour phase epitaxial growth; GaAs; GaAs substrate; InGaAs-GaAsP; InGaAs-GaAsP multiple quantum well structure; InGaAs-GaAsP quantum-well solar cell performance; MOVPE; adsorption range; current gain enhancement; heterostructure growth; lattice relaxation; metal organic vapor phase epitaxy; p-i-n heterolayer; p-i-n multiple quantum well solar cell growth; periodical oscillation; spectral response measurement; strain accumulation influence; strian accumulation; surface morphology; surface reflectance decay; transient reflectance spectra; Indium phosphide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials
  • Conference_Location
    Berlin
  • Print_ISBN
    978-1-4577-1753-6
  • Electronic_ISBN
    978-3-8007-3356-9
  • Type

    conf

  • Filename
    5978314