• DocumentCode
    549388
  • Title

    FT-DLTS studies on deep levels in InAs quantum dashes grown on InP

  • Author

    Zouaoui, Mouna ; Regreny, Philippe ; Ajjel, Ridha ; Girard, Philippe ; Gendry, Michel ; Bremond, Georges

  • Author_Institution
    Inst. des Nanotechnol. de Lyon, Univ. de Lyon, Villeurbanne, France
  • fYear
    2011
  • fDate
    22-26 May 2011
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, we present a DLTS (Deep Level Transient Spectroscopy) study on InAs quantum dashes (QDas) grown by solid source molecular beam epitaxy on InP(001) substrates. These QDas are formed using the Stranski-Krastanow growth mode which undergoes from such strained epitaxy. The control of the growth conditions allows us to dispose of InAs QDas emitting at 1.55 μm. Isothermal capacitance/voltage (C-V-T) and transient capacitance spectroscopy measurements are performed to probe the temperature and electric-field dependence of the electron emission from charged QDas. Due to the high leakage current undergoing by the Schottky contact on the InP capped layer of our sample structure, only three energy levels have been found within the 10K-160K temperature range, at energies of 260 meV, 144 meV and 40 meV below the bottom edge of InP conduction band, respectively. This paper focuses on the study of the different mechanisms of emission process such as tunnelling mechanism and thermionic emission from the QDas confined states in order to identify the energy levels induced by these QDas.
  • Keywords
    III-V semiconductors; Schottky barriers; conduction bands; deep level transient spectroscopy; indium compounds; leakage currents; molecular beam epitaxial growth; semiconductor growth; thermionic electron emission; tunnelling; FT-DLTS; InAs; InP; Schottky contact; Stranski-Krastanow growth mode; conduction band; deep level transient spectroscopy; deep levels; electric-field dependence; electron emission; electron volt energy 144 meV; electron volt energy 260 meV; electron volt energy 40 meV; energy levels; leakage current; quantum dashes; solid source molecular beam epitaxy; temperature 10 K to 160 K; thermionic emission; transient capacitance spectroscopy; tunnelling; Capacitance; Capacitance-voltage characteristics; Electron traps; Indium phosphide; Schottky barriers; Temperature measurement; Tunneling; Activation Energy; C-V-T; Emission Process; FT-DLTS; InAs/InP quantum dashes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials
  • Conference_Location
    Berlin
  • Print_ISBN
    978-1-4577-1753-6
  • Electronic_ISBN
    978-3-8007-3356-9
  • Type

    conf

  • Filename
    5978394