DocumentCode
549582
Title
Applications driving 3D integration and 1 corresponding manufacturing challenges
Author
Topaloglu, Rasit
Author_Institution
GLOBALFOUNDRIES, Milpitas, CA, USA
fYear
2011
fDate
5-9 June 2011
Firstpage
220
Lastpage
223
Abstract
Three dimensional (3D) semiconductor circuit integration has been an active area of research recently. Part of the driving force behind this interest has been applications. In this paper, we identify applications that drive 3D integration and point out the challenges they bring. In particular, we focus on through silicon via-based (TSV-based) 3D integration. TSV-based 3D integration opens up a new genre, and new opportunities for semiconductor integrated circuits. After a brief overview of TSV-based 3D technology overview, we identify driver applications that are dominant in this transition. We then point out challenges in the manufacturing area, i.e., thermal, reliability, EDA, cost, and test.
Keywords
electronic design automation; integrated circuit reliability; three-dimensional integrated circuits; EDA; TSV-based 3D integration; driver applications; driving force; manufacturing challenges; reliability; semiconductor integrated circuits; three dimensional semiconductor circuit integration; through silicon via; Algorithm design and analysis; Bonding; CMOS integrated circuits; Face; Reliability; Silicon; Three dimensional displays; 3D; MEMS; RF; applications; architecture; bonding; challenges EDA; cost; integration; manufacturing; optical; reliability; technology; testing; thermal;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference (DAC), 2011 48th ACM/EDAC/IEEE
Conference_Location
New York, NY
ISSN
0738-100x
Print_ISBN
978-1-4503-0636-2
Type
conf
Filename
5981938
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