Study on Millisecond and Nanosecond laser-induced damage of TiO2/SiO2 anti-reflectors

Author

Wang, Bin ; Zhu, Dehua ; Lu, Jian ; Ni, Xiaowu ; Shen, Zhonghua

Author_Institution

Sch. of Sci., Nanjing Univ. of Sci. & Technol., Nanjing, China

Volume

3

fYear

2011

fDate

29-31 July 2011

Abstract

The laser induced damage threshold (LIDT) of TiO₂/SiO₂ anti-reflectors (AR) acted by 10ns-1064nm and 1ms-1064nm lasers are investigated. The LITD at 10ns and 1ms pulse duration are 2.9J/cm² and 290J/cm², respectively. The damaged morphologies are observed by metallographic microscope. It is found that the damage during 10ns and 1ms pulse duration are film damage and substrate damage, respectively. Analysis of laser-induced damage on AR coatings is carried out by temperature field calculation. Theoretical results show that 1ms laser induced damage depth is deeper than that of the 10ns and meet experimental well.

Keywords

antireflection coatings; laser beam effects; silicon compounds; titanium compounds; TiO₂-SiO₂; antireflector coatings; laser induced damage threshold; metallographic microscopy; millisecond laser-induced damage; nanosecond laser-induced damage; temperature field calculation; time 1 ms; time 10 ns; wavelength 1064 nm; Educational institutions; Heating; Lasers; Optical films; Optical microscopy; Optical reflection; LIDT; damage depth; laser induced damage; optical thin films;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronics and Optoelectronics (ICEOE), 2011 International Conference on

Conference_Location

Dalian, Liaoning

Print_ISBN

978-1-61284-275-2

Type

conf

DOI

10.1109/ICEOE.2011.6013323

Filename

6013323