DocumentCode :
551864
Title :
Injection parameters determination of proton-implanted VCSELs
Author :
Mao, Mingming ; Xu, Chen ; Wei, Simin ; Xie, Yiyang ; Cao, Tian
Author_Institution :
Key Lab. of Opto-Electron. Technol., Beijing Univ. of Technol., Beijing, China
Volume :
3
fYear :
2011
fDate :
29-31 July 2011
Abstract :
In the processing of proton implanted VCSELs, Au and SiO2 are used as the mask to protect the surface against bombardment. Under the guidance of the LSS theory, a series of parameters are designed and optimized, such as the dose, the energy and the thickness of the mask. SRIM are employed to simulation the designed parameters. It can be achieved to fabricating the proton implanted VCSELs under the condition of three times bombardment and suitable thickness of mask, where the energy are 330kev, 250kev, 160kev and the mask are 1.5μm, 0.5μm. When the parameters are used to fabricate the VCSELs, we get a device performance of 0.5mw output power, and the threshold current is 6.5mA, which is similar to the reported earlier.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; gold; ion implantation; laser cavity resonators; masks; optical fabrication; quantum well lasers; semiconductor doping; silicon compounds; surface emitting lasers; Au-SiO2-AlxGa1-xAs-GaAs-AlxGa1-xAs; LSS theory; SRIM; dose; electron volt energy 160 keV to 330 keV; energy; injection parameters; mask thickness; output power; power 0.5 mW; proton-implanted VCSEL; size 0.5 mum; size 1.5 mum; threshold current; Atomic measurements; Cavity resonators; Gallium arsenide; Laser theory; Vertical cavity surface emitting lasers; VCSELs; implantation parameters; proton implanted;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics and Optoelectronics (ICEOE), 2011 International Conference on
Conference_Location :
Dalian
Print_ISBN :
978-1-61284-275-2
Type :
conf
DOI :
10.1109/ICEOE.2011.6013355
Filename :
6013355
Link To Document :
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