• DocumentCode
    552149
  • Title

    Stress-induced modal dispersion on SOI waveguide

  • Author

    Lu, Tse-Jen ; Tseng, Sheng-Chieh ; Hsu, Shih-Hsiang

  • Author_Institution
    Dept. of Electron. Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
  • fYear
    2011
  • fDate
    4-8 July 2011
  • Firstpage
    497
  • Lastpage
    498
  • Abstract
    We utilized a phase-sensitive low-coherence interferometry to characterize the stress-induced intermodal group delay and intramodal dispersion in a 5-μm thick silicon-on-insulator waveguide, which were demonstrated as 0.43 ps and -16 ps/(nm.km), respectively.
  • Keywords
    integrated optics; optical communication equipment; optical dispersion; optical testing; optical waveguides; phase shifting interferometry; piezo-optical effects; silicon-on-insulator; SOI waveguide; Si-SiO2; optical telecommunications; phase-sensitive low-coherence interferometry; silicon-on-insulator waveguide; size 5 mum; stress-induced intermodal group delay; stress-induced modal dispersion; Chromatic dispersion; Optical interferometry;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Opto-Electronics and Communications Conference (OECC), 2011 16th
  • Conference_Location
    Kaohsiung
  • Print_ISBN
    978-1-61284-288-2
  • Electronic_ISBN
    978-986-02-8974-9
  • Type

    conf

  • Filename
    6015229
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=552149