DocumentCode
563284
Title
Novel applications of intense pulsed ion beams in materials science
Author
Yatsui, K. ; Jiang, W. ; Suematsu, H. ; Endo, F. ; Yang, S.C.
Author_Institution
Extreme Energy Density Research Institute, Nagaoka Univeristy of Technology, Niigata 940-2188, Japan
Volume
1
fYear
2002
fDate
23-28 June 2002
Firstpage
401
Lastpage
404
Abstract
Using pulsed ion beam evaporation technique, experimental studies were carried out to embed metals into via holes in LSI. It will be shown that tungsten is successfully embedded in via holes with the aspect ratio of 4.3. Furthermore, light emission of blue has been observed from a poly silicon nanosize powders, which is also produced by pulsed ion beam evaporation technique.
Keywords
Large scale integration; Magnetic resonance imaging; Plasmas; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
High-Power Particle Beams (BEAMS), 2002 14th International Conference on
Conference_Location
Albuquerque, NM, USA
ISSN
0094-243X
Print_ISBN
978-0-7354-0107-5
Type
conf
Filename
6219473
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