DocumentCode :
563465
Title :
Substrate fed logic - An improved form of injection logic
Author :
Blatt, V. ; Kennedy, L W ; Walsh, P.S. ; Ashford, R.C.A.
Author_Institution :
Allen Clark Res. Centre, Plessey Co. Ltd., Towcester, UK
fYear :
1974
fDate :
9-11 Dec. 1974
Firstpage :
511
Lastpage :
514
Abstract :
A novel form of integrated injection logic is described which has significant advantages over its conventional counterpart in packing density and power-delay product. The structure is formed from two epitaxial layers on a heavily doped p type substrate. The p type epitaxial layer, which forms the base of the npn transistor, is lightly doped, allowing the fabrication of Schottky contacts. This gives rise to an extremely powerful multi-input, multi-output logic element on a single base land. The fundamental SFL structure has been successfully demonstrated. Gates and a ring oscillator have been operated and a reduction in power-delay product has been shown. A viable technology for Schottky Barrier Diodes has been demonstrated and an optimised structure has been designed.
Keywords :
MOSFET; Schottky barriers; Schottky diodes; heavily doped semiconductors; integrated injection logic; oscillators; semiconductor epitaxial layers; SFL structure; Schottky barrier diodes; Schottky contacts fabrication; heavily doped p-type substrate; integrated injection logic; multiinput multioutput logic element; n-p-n transistor; p-type epitaxial layer; packing density; power-delay product; ring oscillator; single base land; Abstracts; Epitaxial growth; Implants; Logic gates; Schottky diodes; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 1974 International
Conference_Location :
Washington, DC
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1974.6219673
Filename :
6219673
Link To Document :
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