Title :
Application of AWE technology combined with higher-order basis functions to broad band electromagnetic scattering problems
Author :
Ma, Tao ; Chen, Ming-sheng ; Wu, Xian-liang ; Qi, Qi ; Liu, Yi ; Hao, Ming-ming
Author_Institution :
Key Lab. of Intell. Comput. & Signal Process., Anhui Univ., Hefei, China
Abstract :
In this paper, the asymptotic waveform evaluation (AWE) technique in conjugation with higher-order basis functions method based on the best uniform approximation theory is applied to solve scattering problems over a broad frequency band. To select the best uniform approximation higher-order basis functions, 3-order Chebyshev basis function is used as an example and applied to solving the electrical field integral equation (EFIE) by the method of moments(MOM). Finally, using AWE technique to solving the discrete linear system obtained by high order basis function to accomplish the scattering analysis of perfectly electrical conductor (PEC) over a broad frequency band. It is shown that the presented method has higher computational precision with lower discretization, and greatly improve the computational efficiency.
Keywords :
conductors (electric); electric field integral equations; electromagnetic wave scattering; method of moments; 3-order Chebyshev basis function; AWE technique; AWE technology; EFIE; MOM; PEC; asymptotic waveform evaluation; broad band electromagnetic scattering problems; broad frequency band; computational efficiency; discretization; electrical field integral equation; higher-order basis functions; higher-order basis functions method; method of moments; perfectly electrical conductor; scattering problems; uniform approximation higher-order basis functions; Chebyshev approximation; Frequency response; Impedance; Moment methods; Polynomials; Radar cross section; Asymptotic Waveform Evaluation; Best Uniform Approximation; Higher-order Basis Functions; Radar Cross Section;
Conference_Titel :
Microwave and Millimeter Wave Technology (ICMMT), 2012 International Conference on
Conference_Location :
Shenzhen
Print_ISBN :
978-1-4673-2184-6
DOI :
10.1109/ICMMT.2012.6230138