Multi-Height Precision Alignment With Selectively Developed Alignment Marks

Author

Heymann, Michael ; Fraden, Seth ; Dongshin Kim

Author_Institution

Grad. Sch. of Arts & Sci., Brandeis Univ., Waltham, MA, USA

Volume

23

Issue

2

fYear

2014

fDate

Apr-14

Firstpage

424

Lastpage

427

Abstract

The alignment step in fabricating multi-height photoresist masters is a critical and time-consuming process. SU8 masters that combine very thin and thick layers can be difficult to align because of low contrast visibility. We increase visual contrast by selectively developing alignment marks to ease fabrication of masters with thick resist layers deposited on much thinner ones. In addition, we use a vernier calliper based alignment mark to achieve high precision alignment.

Keywords

microfabrication; microfluidics; photoresists; SU8 masters; low contrast visibility; microelectromechanical systems; microfabrication; microfluidics; multiheight photoresist master fabrication; multiheight precision alignment; selectively developed alignment marks; thick layers; thin layers; vernier calliper based alignment mark; visual contrast; Educational institutions; Fabrication; Microelectromechanical systems; Microscopy; Nanobioscience; Resists; Microfabrication; alignment; lithography; microelectromechanical systems; microfluidics;

fLanguage

English

Journal_Title

Microelectromechanical Systems, Journal of

Publisher

ieee

ISSN

1057-7157

Type

jour

DOI

10.1109/JMEMS.2013.2279231

Filename

6589983