Title :
Statistical memristor modeling and case study in neuromorphic computing
Author :
Pino, R.E. ; Hai Li ; Yiran Chen ; Miao Hu ; Beiye Liu
Author_Institution :
Air Force Res. Lab., Rome, NY, USA
Abstract :
Memristor, the fourth passive circuit element, has attracted increased attention since it was rediscovered by HP Lab in 2008. Its distinctive characteristic to record the historic profile of the voltage/current creates a great potential for future neuromorphic computing system design. However, at the nano-scale, process variation control in the manufacturing of memristor devices is very difficult. The impact of process variations on a memristive system that relies on the continuous (analog) states of the memristors could be significant. We use TiO2-based memristor as an example to analyze the impact of geometry variations on the electrical properties. A simple algorithm was proposed to generate a large volume of geometry variation-aware three-dimensional device structures for Monte-Carlo simulations. A neuromorphic computing system based on memristor-based bidirectional synapse design is proposed as case study. We analyze and evaluate the robustness of the proposed system in pattern recognition based on massive Monte-Carlo simulations, after considering input defects and process variations.
Keywords :
Monte Carlo methods; electronic engineering computing; memristors; nanoelectronics; passive networks; semiconductor device manufacture; titanium compounds; HP Lab; Monte Carlo simulations; TiO2; TiO2-based memristor; continuous states; electrical properties; fourth passive circuit element; geometry variations; input defects variations; memristor devices manufacturing; memristor-based bidirectional synapse design; neuromorphic computing system; process variation control; statistical memristor modeling; three-dimensional device structures; voltage-current historic profile; Doping; Electrodes; Geometry; Memristors; Monte Carlo methods; Neurons; Semiconductor process modeling; Memristor; neural network; pattern recognition; process variation;
Conference_Titel :
Design Automation Conference (DAC), 2012 49th ACM/EDAC/IEEE
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4503-1199-1