• DocumentCode
    565184
  • Title

    Statistical memristor modeling and case study in neuromorphic computing

  • Author

    Pino, R.E. ; Hai Li ; Yiran Chen ; Miao Hu ; Beiye Liu

  • Author_Institution
    Air Force Res. Lab., Rome, NY, USA
  • fYear
    2012
  • fDate
    3-7 June 2012
  • Firstpage
    585
  • Lastpage
    590
  • Abstract
    Memristor, the fourth passive circuit element, has attracted increased attention since it was rediscovered by HP Lab in 2008. Its distinctive characteristic to record the historic profile of the voltage/current creates a great potential for future neuromorphic computing system design. However, at the nano-scale, process variation control in the manufacturing of memristor devices is very difficult. The impact of process variations on a memristive system that relies on the continuous (analog) states of the memristors could be significant. We use TiO2-based memristor as an example to analyze the impact of geometry variations on the electrical properties. A simple algorithm was proposed to generate a large volume of geometry variation-aware three-dimensional device structures for Monte-Carlo simulations. A neuromorphic computing system based on memristor-based bidirectional synapse design is proposed as case study. We analyze and evaluate the robustness of the proposed system in pattern recognition based on massive Monte-Carlo simulations, after considering input defects and process variations.
  • Keywords
    Monte Carlo methods; electronic engineering computing; memristors; nanoelectronics; passive networks; semiconductor device manufacture; titanium compounds; HP Lab; Monte Carlo simulations; TiO2; TiO2-based memristor; continuous states; electrical properties; fourth passive circuit element; geometry variations; input defects variations; memristor devices manufacturing; memristor-based bidirectional synapse design; neuromorphic computing system; process variation control; statistical memristor modeling; three-dimensional device structures; voltage-current historic profile; Doping; Electrodes; Geometry; Memristors; Monte Carlo methods; Neurons; Semiconductor process modeling; Memristor; neural network; pattern recognition; process variation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference (DAC), 2012 49th ACM/EDAC/IEEE
  • Conference_Location
    San Francisco, CA
  • ISSN
    0738-100X
  • Print_ISBN
    978-1-4503-1199-1
  • Type

    conf

  • Filename
    6241566