• DocumentCode
    568604
  • Title

    Analysis and Optimization of Thermal Effect on STT-RAM Based 3-D Stacked Cache Design

  • Author

    Bi, Xiuyuan ; Li, Hai ; Kim, Jae-Joon

  • Author_Institution
    ECE Dept., Polytech. Inst. of New York Univ., Brooklyn, NY, USA
  • fYear
    2012
  • fDate
    19-21 Aug. 2012
  • Firstpage
    374
  • Lastpage
    379
  • Abstract
    Spin-Transfer Torque Random Access Memory (STT-RAM) has been proved a promising emerging nonvolatile memory technology suitable for many applications such as cache memory of CPU. Simulation results show that the switching time of Magnetic Tunnel Junction (MTJ), which is the core element of the STT-RAM cell, varies when the temperature changes. In this paper, we study the thermal effect on switching time of STT-RAM cell, and it is showed that when temperature changes from 300K to 375K, the required write pulse period to achieve 10-8 bit error rate (BER) increases from 10.02ns to 15.04ns under 45nm technology. When STT-RAM is used as 3-D stacked L3 cache, the required write pulse period ranges from 11.42ns to 14.68ns due to temperature variation caused by the CPU core layer. If the thermal effect is not considered, the BER of the hottest region will significantly increase to 10-4. Based on these observations, an optimization design with Dynamic Temperature Aware Write Access is proposed, to increase the efficiency of accessing a 3-D stacked STT-RAM cache, as well as achieve the target BER. Compared to a conventional design, the proposed scheme can improve the CPU performance by 3.8% and reduce the write energy consumption of the STT-RAM cache by 4.8%.
  • Keywords
    error statistics; magnetic tunnelling; random-access storage; BER; CPU core layer; MTJ; STT-RAM based 3D stacked cache design; bit error rate; cache memory; dynamic temperature aware write access; magnetic tunnel junction; nonvolatile memory technology; optimization design; size 45 nm; spin-transfer torque random access memory; temperature 300 K to 375 K; temperature variation; thermal effect; time 10.02 ns to 15.04 ns; write energy consumption reduction; write pulse period; Bit error rate; Magnetic tunneling; Resistance; Switches; Temperature dependence; Temperature distribution; Temperature sensors; STT-RAM; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI (ISVLSI), 2012 IEEE Computer Society Annual Symposium on
  • Conference_Location
    Amherst, MA
  • ISSN
    2159-3469
  • Print_ISBN
    978-1-4673-2234-8
  • Type

    conf

  • DOI
    10.1109/ISVLSI.2012.56
  • Filename
    6296502