• DocumentCode
    572867
  • Title

    The fabrication and research Of 4H-Sic Schottky metal-semiconductor-metal ultraviolet photodetectors

  • Author

    Zhang, Junqin ; Yang, Yintang ; Jia, Hujun ; Chai, Changchun ; Zhu, Hongfeng

  • Author_Institution
    Key Lab. of Wide Band-Gap Semicond. Mater. & devices of Educ. Minist., Xidian Univ., Xi´´an, China
  • fYear
    2012
  • fDate
    24-26 Aug. 2012
  • Firstpage
    307
  • Lastpage
    309
  • Abstract
    The fabrication and characterization of 4H-SiC Schottky metal-semiconductor-metal(MSM) photodetectors are reported in this paper. The current-voltage(I-V), capacitance-voltage(C-V) and spectral response characterization of the photodetectors are measured at room temperature. The dark current is 1.24 × 10-8A at 4V bias, and the average capacitance is 82.66pF at 0-5V voltage range. The spectral response range is from 250nm to 350 nm wavelength, and the highest responsivity appears at the wavelength of 280 nm. The results indicate that the 4H-SiC photodetectors are visible-blind.
  • Keywords
    optical fabrication; photodetectors; silicon compounds; ultraviolet detectors; wide band gap semiconductors; C-V characterization; I-V characterization; MSM photodetectors; Schottky metal-semiconductor-metal ultraviolet photodetectors; SiC; capacitance-voltage characterization; current-voltage characterization; dark current; spectral response characterization; temperature 293 K to 298 K; voltage 0 V to 5 V; wavelength 250 nm to 350 nm; Epitaxial growth; Physics; Semiconductor diodes; Silicon; 4H-SiC; metal-semiconductor-metal (MSM); ultraviolet(UV) photodetector;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computer Science and Information Processing (CSIP), 2012 International Conference on
  • Conference_Location
    Xi´an, Shaanxi
  • Print_ISBN
    978-1-4673-1410-7
  • Type

    conf

  • DOI
    10.1109/CSIP.2012.6308855
  • Filename
    6308855