• DocumentCode
    58287
  • Title

    Determination of doping and temperature-dependent elastic constants of degenerately doped silicon from MEMS resonators

  • Author

    Jaakkola, Anttoni ; Prunnila, Mika ; Pensala, Tuomas ; Dekker, James ; Pekko, Panu

  • Author_Institution
    VTT Tech. Res. Centre of Finland, Espoo, Finland
  • Volume
    61
  • Issue
    7
  • fYear
    2014
  • fDate
    Jul-14
  • Firstpage
    1063
  • Lastpage
    1074
  • Abstract
    Elastic constants c11, c12, and c44 of degenerately doped silicon are studied experimentally as a function of the doping level and temperature. First-and second-order temperature coefficients of the elastic constants are extracted from measured resonance frequencies of a set of MEMS resonators fabricated on seven different wafers doped with phosphorus (carrier concentrations 4.1, 4.7, and 7.5 × 1019 cm-3), arsenic (1.7 and 2.5 × 1019 cm-3), or boron (0.6 and 3 × 1019 cm-3). Measurements cover a temperature range from -40°C to +85°C. It is found that the linear temperature coefficient of the shear elastic parameter c11 - c12 is zero at n-type doping level of n ~ 2 × 1019 cm-3, and that it increases to more than 40 ppm/K with increasing doping. This observation implies that the frequency of many types of resonance modes, including extensional bulk modes and flexural modes, can be temperature compensated to first order. The second-order temperature coefficient of c11 - c12 is found to decrease by 40% in magnitude when n-type doping is increased from 4.1 to 7.5 × 1019 cm-3. Results of this study enable calculation of the frequency drift of an arbitrary silicon resonator design with an accuracy of ±25 ppm between the calculated and real(ized) values over T = -40°C to +85°C at the doping levels covered in this work. Absolute frequency can be estimated with an accuracy of ±1000 ppm.
  • Keywords
    carrier density; doping; elastic constants; micromechanical resonators; silicon; MEMS resonators; Si; arbitrary silicon resonator design; arsenic; boron; carrier concentrations; degenerately doped silicon; doping determination; doping level function; extensional bulk modes; first-order temperature coefficients; flexural modes; frequency drift calculation; linear temperature coefficient; measured resonance frequency; n-type doping level; phosphorus; resonance modes; second-order temperature coefficients; shear elastic parameter; temperature -40 C to 85 C; temperature compensation; temperature function; temperature range; temperature-dependent elastic constants; wafers; Doping; Frequency control; Frequency measurement; Resonant frequency; Sensitivity; Silicon; Temperature measurement;
  • fLanguage
    English
  • Journal_Title
    Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-3010
  • Type

    jour

  • DOI
    10.1109/TUFFC.2014.3007
  • Filename
    6838803