DocumentCode :
585585
Title :
Intense, pulsed, ion-diode sources and their application to mirror machines
Author :
Prono, D.S. ; Shearer, J.W. ; Briggs, R.J.
Author_Institution :
Lawrence Livermore Lab., Univ. of California, Livermore, Livermore, CA, USA
Volume :
1
fYear :
1975
fDate :
3-5 Nov. 1975
Firstpage :
575
Lastpage :
589
Abstract :
Startup conditions for future mirror fusion experiments require a rapidly formed target plasma of ~0.5 coulomb of ions with energy of 50 to 100 keV. Theory suggests that very intense ion-flux emission satisfying these requirements can be extracted from a pulsed ion diode. Developing such sources would be an ideal CTR application of the high-power, single-shot capability of pulsed power technology. Recent experimental results are reviewed in which ~2 kA/cm2 of D+ at ~50 keV was extracted. In the experiment, an intense relativistic electron beam undergoes many transits through a solid but range-thin anode foil. With each transit the electrons lose energy, causing their trajectories to collapse toward the anode surface. In so doing, the increased space charge extracts an intense ion flux from the anode foil IS plasma. Observations are reported on the importance of diode stability. The general agreement between theoretical scaling laws and experimental results is also presented.
Keywords :
diodes; ion sources; relativistic electron beams; CTR application; anode foil IS plasma; electron volt energy 50 keV to 100 keV; intense ion flux; intense ion-diode sources; ion-flux emission; mirror fusion; mirror machines; pulsed ion diode; pulsed ion-diode sources; range thin anode foil; space charge; target plasma;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Beam Research & Technology, 1975 International Topical Conference on
Conference_Location :
Albuquerque, NM
Print_ISBN :
0-8493-6926-6
Type :
conf
Filename :
6397707
Link To Document :
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