Title :
Sensitivity improvement in FSI CIS using the M1ToP™ smart process technique
Author :
Manlyun Ha ; Sun Choi ; DongHun Cho ; Hosoo Kim ; Jungyeon Cho ; Youngsun Oh ; Jongman Kim ; Sangwon Yoon ; Changhoon Choi ; Juneseok Lee ; Juil Lee ; Joon Hwang
Author_Institution :
Process Dev. Team 4, Fab2, Eumsung, South Korea
Abstract :
Using the W damascene process in the pixel area, M1Top pixel structure was developed. Because the M1Top pixel structure does not use the metal2 layer in the pixel block, total stack height becomes much thinner than normal pixels. From this new structure, sensitivity and QE in 1.75um pixels have been improved by 50% from that of normal M2Top pixels in 0.11um CIS process.
Keywords :
intelligent sensors; FSI CIS; M1ToP smart process; M1Top pixel structure; W damascene process; size 1.75 mum; Apertures; Lenses; Logic gates; Metals; Microoptics; Optical sensors; Sensitivity; Angular Response; M1Top pixel; M2Top pixel; QE; Sensitivity;
Conference_Titel :
SoC Design Conference (ISOCC), 2012 International
Conference_Location :
Jeju Island
Print_ISBN :
978-1-4673-2989-7
Electronic_ISBN :
978-1-4673-2988-0
DOI :
10.1109/ISOCC.2012.6407104
