DocumentCode
58951
Title
A Sub-
-Size Modulator Beyond the Efficiency-Loss Limit
Author
Chen Huang ; Lamond, Rory J. ; Pickus, Sarah K. ; Zhuo Ran Li ; Sorger, Volker J.
Author_Institution
Dept. of Electr. & Comput. Eng., George Washington Univ., Washington, DC, USA
Volume
5
Issue
4
fYear
2013
fDate
Aug. 2013
Firstpage
2202411
Lastpage
2202411
Abstract
Electrooptic modulators (EOMs) are key devices in performing the conversion between the electrical and optical domains in data communication links. With respect to a road map for photonic computing, future EOMs are required to be highly scalable, should feature strong modulation performance, and must not consume much power during operation. In light of these requirements, here, we investigate indium-tin-oxide (ITO) as an electrooptic switching material. The results show that ITO is capable of changing its extinction coefficient by a factor of 136. Utilizing these findings, we analyze an ultracompact (i.e., sub- λ long λ = 1310 nm) electroabsorption modulator based on a plasmonic MOS-mode design. In our analysis, we investigate the performance, i.e., the extinction ratio and insertion loss of the device as a function of various geometric parameters of the device. The optimized device is 0.78 λ long and features an extinction ratio and on-chip insertion loss of about 6 dB/μm and 0.7 dB, respectively. Furthermore, we suggest a metric to benchmark electroabsorption modulators and show that silicon plasmonics has potential for high-end switching nodes in future integrated photonic circuits.
Keywords
MIS devices; electro-optical modulation; electro-optical switches; electroabsorption; elemental semiconductors; extinction coefficients; indium compounds; integrated optoelectronics; optical design techniques; optical losses; plasmonics; silicon; tin compounds; EOM; ITO; Si; benchmarking; data communication links; efficiency-loss limit; electrical domain; electrooptic modulators; electrooptic switching material; extinction coefficient; geometric parameters; high-end switching nodes; indium-tin-oxide; integrated photonic circuits; modulation performance; on-chip insertion loss; optical domain; optimized device; photonic computing; plasmonic MOS-mode design; silicon plasmonics; sub-λ-size modulator; ultracompact electroabsorption modulator; wavelength 1310 nm; Electrooptic modulators; Electrooptical waveguides; Indium tin oxide; Materials; Plasmons; Silicon nanophotonics; nonlinear integrated optics; plasmonics optoelectronic materials; waveguide devices;
fLanguage
English
Journal_Title
Photonics Journal, IEEE
Publisher
ieee
ISSN
1943-0655
Type
jour
DOI
10.1109/JPHOT.2013.2274772
Filename
6568903
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