• DocumentCode
    58967
  • Title

    First Principle Simulations of Various Magnetic Tunnel Junctions \\ker n-2pt for \\ker n-2pt

  • Author

    Chakraverty, Mayank ; Kittur, Harish M. ; Kumar, Pattem Ashok

  • Author_Institution
    IBM, Bangalore, India
  • Volume
    12
  • Issue
    6
  • fYear
    2013
  • fDate
    Nov. 2013
  • Firstpage
    971
  • Lastpage
    977
  • Abstract
    This paper reports the first principle simulations of Fe/MgO/Fe, Fe/Y2O3/Fe, Fe/HfO2/Fe, and Fe/Al2O3/Fe magnetic tunnel junctions (MTJs). From the device-level and circuit-level simulations carried out in this paper, the Fe/MgO/Fe configuration has been found to be the best. From the device-level simulations, all the four configurations of MTJs have been compared with regards to the bias dependence of tunnel magnetoresistance ratios (TMRs), insulator thickness dependence of TMR, and insulator thickness dependence of parallel and antiparallel state resistances. Finally, from the circuit-level simulations, the static and switching power dissipations have been computed along with the delay time estimation.
  • Keywords
    hafnium compounds; iron; magnesium compounds; random-access storage; yttrium compounds; Fe-Al2O3-Fe; Fe-HfO2-Fe; Fe-MgO-Fe; Fe-Y2O3-Fe; antiparallel state resistances; circuit-level simulations; device-level simulations; insulator thickness dependence; magnetic tunnel junctions; magnetoresistive random access memories; tunnel magnetoresistance ratios; Atomic layer deposition; Insulators; Iron; Magnetic separation; Magnetic tunneling; Resistance; Tunneling magnetoresistance; Density functional theory (DFT); MRAM; local spin density approximation (LSDA); magnetic tunnel junction (MTJ);
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2013.2274902
  • Filename
    6568905