DocumentCode
58967
Title
First Principle Simulations of Various Magnetic Tunnel Junctions
for
Author
Chakraverty, Mayank ; Kittur, Harish M. ; Kumar, Pattem Ashok
Author_Institution
IBM, Bangalore, India
Volume
12
Issue
6
fYear
2013
fDate
Nov. 2013
Firstpage
971
Lastpage
977
Abstract
This paper reports the first principle simulations of Fe/MgO/Fe, Fe/Y2O3/Fe, Fe/HfO2/Fe, and Fe/Al2O3/Fe magnetic tunnel junctions (MTJs). From the device-level and circuit-level simulations carried out in this paper, the Fe/MgO/Fe configuration has been found to be the best. From the device-level simulations, all the four configurations of MTJs have been compared with regards to the bias dependence of tunnel magnetoresistance ratios (TMRs), insulator thickness dependence of TMR, and insulator thickness dependence of parallel and antiparallel state resistances. Finally, from the circuit-level simulations, the static and switching power dissipations have been computed along with the delay time estimation.
Keywords
hafnium compounds; iron; magnesium compounds; random-access storage; yttrium compounds; Fe-Al2O3-Fe; Fe-HfO2-Fe; Fe-MgO-Fe; Fe-Y2O3-Fe; antiparallel state resistances; circuit-level simulations; device-level simulations; insulator thickness dependence; magnetic tunnel junctions; magnetoresistive random access memories; tunnel magnetoresistance ratios; Atomic layer deposition; Insulators; Iron; Magnetic separation; Magnetic tunneling; Resistance; Tunneling magnetoresistance; Density functional theory (DFT); MRAM; local spin density approximation (LSDA); magnetic tunnel junction (MTJ);
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2013.2274902
Filename
6568905
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