DocumentCode :
590338
Title :
Evidence of deep ultraviolet amplified spontaneous emission in electron beam pumped AlGaN multiple-quantum-well-based structures
Author :
Nikiforov, Alexander Y. ; Zhang, Wensheng ; Woodward, J. ; Yin, Jianwei ; Paiella, R. ; Ludwig, K.F. ; Moustakas, T.D. ; Zhou, Liang ; Smith, Dante J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Boston Univ., Boston, MA, USA
fYear :
2012
fDate :
7-9 Aug. 2012
Firstpage :
1
Lastpage :
4
Abstract :
In this paper we report detailed cathodoluminescence (CL) studies of deep UV emitting AlGaN multiple quantum wells (MQWs) embedded in AlN cladding layers to simulate a deep UV laser structure. These structures were produced by plasma-assisted molecular beam epitaxy (MBE) on 6H-SiC substrates. The AlGaN QWs were grown under excess gallium conditions, a growth mode consistent with liquid phase epitaxy rather than physical vapor phase epitaxy. This growth mode leads to AlGaN films with compositional inhomogeneities and thus band structure potential fluctuations. The degree of such compositional inhomogeneities depends on the amount of excess gallium and employment of indium as a surfactant during growth. The structure and microstructure of these MQWs were investigated by x-ray diffraction and TEM/STEM. Their optical properties were investigated with spatially-resolved CL spectroscopy and mapping. E-beam pumping experiments were performed by irradiating the top surface and collecting the luminescence from the cleaved edge. The observed superlinear dependence of the QW CL intensity on beam current together with linewidth narrowing strongly suggests light amplification by stimulated emission.
Keywords :
III-V semiconductors; X-ray diffraction; aluminium compounds; band structure; cathodoluminescence; claddings; electron beam pumping; gallium compounds; molecular beam epitaxial growth; plasma deposition; scanning-transmission electron microscopy; semiconductor growth; semiconductor quantum wells; semiconductor thin films; spectral line intensity; spectral line narrowing; stimulated emission; superradiance; surfactants; wide band gap semiconductors; 6H-SiC substrates; AlGaN-AlN; E-beam pumping; MBE; QW CL intensity; STEM; SiC; X-ray diffraction; band structure potential fluctuations; beam current; cathodoluminescence; cladding layers; cleaved edge; compositional inhomogeneities; deep UV emitting MQW; deep UV laser structure; deep ultraviolet amplified spontaneous emission; electron beam pumped multiple-quantum-well-based structures; excess gallium conditions; films; growth mode; light amplification; linewidth narrowing; microstructure; optical properties; plasma-assisted molecular beam epitaxy; spatially-resolved CL spectroscopy; stimulated emission; superlinear dependence; surfactant; top surface irradiation; Aluminum gallium nitride; Light emitting diodes; Molecular beam epitaxial growth; Nonhomogeneous media; Quantum well devices; Stimulated emission; Substrates; Deep UV emitting AlGaN quantum wells; cathodoluminescence; deep UV lasers; electron beam pumping; molecular beam epitaxy; stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lester Eastman Conference on High Performance Devices (LEC), 2012
Conference_Location :
Singapore
Print_ISBN :
978-1-4673-2298-0
Electronic_ISBN :
978-1-4673-2300-0
Type :
conf
DOI :
10.1109/lec.2012.6410975
Filename :
6410975
Link To Document :
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