Title :
Occurrence of the Si particles
Author :
Kim, Y.W. ; Kim, Jae Min ; Jeon, Y.I.
Author_Institution :
Samsung Inst. of Technol., Samsung Display Co., Yongin, South Korea
Abstract :
The Excimer(combination word of excited state of dimer) UV is the most utilized pre-cleaning process in TFT manufacturing system. It removes many organic impurities on the surface of the TFT Glass as using the Ultra-Violet. Through the Excimer UV lamp, if the UV of 172nm wave is exposed by 172nm, the impurities change into the hydrophile properties. On the contrary, the Excimer UV occur the different micro by-products, called the Si particles. Those make the defective products like GD-Short, DATA-Open and etc. For the improvement of the weakness point, we studied the effectiveness of the periodical precision cleaning which is the most existed in the N2 Diffuser of Excimer UV.
Keywords :
excimers; photochemistry; silicon; surface cleaning; thin film transistors; Si; TFT manufacturing system; dimer excited state; excimer UV lamp; hydrophile properties; precleaning process; reducing method; wavelength 172 nm; Cleaning; Electron tubes; Glass; Impurities; Silicon; Surface treatment; Thin film transistors; DATA Open; Excimer UV; GD Short; N2 Diffuser; Si particles; contaminations; removal; the periodical precision cleaning;
Conference_Titel :
Photonics Global Conference (PGC), 2012
Conference_Location :
Singapore
Print_ISBN :
978-1-4673-2513-4
DOI :
10.1109/PGC.2012.6458118
