DocumentCode
59444
Title
Current Conduction Model for Oxide-Based Resistive Random Access Memory Verified by Low-Frequency Noise Analysis
Author
Fang, Zhou ; Yu, H.Y. ; Fan, W.J. ; Ghibaudo, Gerard ; Buckley, Joseph ; DeSalvo, B. ; Li, Xin ; Wang, X.P. ; Lo, G.Q. ; Kwong, D.L.
Author_Institution
Inst. of Microelectron., Agency for Sci., Technol. & Res. (A*STAR), Singapore, Singapore
Volume
60
Issue
3
fYear
2013
fDate
Mar-13
Firstpage
1272
Lastpage
1275
Abstract
A conduction model consisting of two parallel resistances from a highly conductive filament region and a uniform leakage oxide region is proposed in this brief to represent the current conduction in the filament-type switching resistive random access memory cell. Low-frequency noise analysis of current fluctuation at different resistance states has been employed to verify its efficiency. It is found that, in the low-resistance regime, filament resistance dominates current conduction and noise varies as a power law of resistance, whereas in the high-resistance regime, uniform oxide leakage is the major source of conduction, giving rise to a nearly constant noise level.
Keywords
random-access storage; current conduction model; current fluctuation; filament resistance; filament-type switching resistive random access memory cell; highly-conductive filament region; low-frequency noise analysis; oxide-based resistive random access memory; parallel resistances; uniform-leakage oxide region; Analytical models; Hafnium compounds; Noise; Radio frequency; Resistance; Silicon; Switches; Current conduction model; low-frequency noise (LFN); resistive switching;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2013.2240457
Filename
6463447
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