DocumentCode
59555
Title
Differentiated Doping Profile for Vertical Terahertz GaN Transferred-Electron Devices
Author
Dalle, Christophe Francois
Author_Institution
Dept. Hyperfreq. et Semicond., Inst. d´Electron. de Microelectron. et de Nanotechnol., Villeneuve d´Ascq, France
Volume
62
Issue
3
fYear
2015
fDate
Mar-15
Firstpage
802
Lastpage
807
Abstract
The potential of vertical differentiated gallium nitride (GaN) transferred electron devices (TEDs) is compared with that of the base flat doping profile TED for the realization of RF power sources at 1 THz. The TED oscillator modeling is a time-domain continuous wave pure sine model. The semiconductor device model is a 1-D numerical physical macroscopic model based on the energy-momentum approach. Differentiated structures of notch, detached notch, and P+ spike (PS) types have been optimized. By contrast with millimeter-wave differentiated TEDs operating in the dipole domain mode, the terahertz TED RF operating mode remains the accumulation layer/transit time mode. Comparison point out that the differentiated doping profile TEDs slightly improve both the TED RF performance and electronic limitation but above all improve the thermal limitation resulting from the high dc bias conditions due to high threshold electric field in GaN. Thus, the PS TED distinguishes itself as the most promising structure.
Keywords
Gunn devices; III-V semiconductors; doping profiles; gallium compounds; semiconductor device models; semiconductor doping; terahertz wave devices; wide band gap semiconductors; 1D numerical physical macroscopic model; GaN; P+ spike type notch; TED oscillator modeling; detached notch; differentiated doping profile; dipole domain mode; energy-momentum approach; frequency 1 THz; millimeter-wave differentiated TEDs; semiconductor device model; terahertz TED; time-domain continuous wave pure sine model; vertical terahertz transferred-electron devices; Doping; Gallium nitride; Oscillators; Performance evaluation; Radio frequency; Resistance; Semiconductor process modeling; Differentiated doping profile; fundamental accumulation layer and transit time operating mode; time-domain energy-momentum modeling; vertical terahertz gallium nitride (GaN) transferred electron device (TED); vertical terahertz gallium nitride (GaN) transferred electron device (TED).;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2015.2392158
Filename
7036082
Link To Document