DocumentCode
597292
Title
Electrochemical aluminium oxide technology for production of electronics
Author
Sokol, V. ; Shulgov, V.
Author_Institution
Belarusian State University of Informatics and Radioelectronics (BSUIR), Minsk, Belarus
fYear
2012
fDate
3-7 Sept. 2012
Firstpage
55
Lastpage
56
Abstract
The paper reviews the results of application of porous alumina formed using the electrochemical anodization process. Porous alumina is widely used in the microelectronics as a) anodized aluminum bases, b)systems of multilevel interconnections, c) aluminum packages for VLSIs and hybrid integrated circuits, d) thin-film temperature sensors, e) Al-based heating elements etc. Parameters of the structures with porous anodic alumina are summarized depending on the anodizing conditions.
Keywords
Aluminum; Dielectrics; Heating; Integrated circuit interconnections; Resistance; Substrates; Temperature sensors; aluminum; electrochemical anodizing; multicrystalline modules; multilevel interconnection; porous anodic alumina;
fLanguage
English
Publisher
ieee
Conference_Titel
Oxide Materials for Electronic Engineering (OMEE), 2012 IEEE International Conference on
Conference_Location
Lviv, Ukraine
Print_ISBN
978-1-4673-4491-3
Type
conf
DOI
10.1109/OMEE.2012.6464845
Filename
6464845
Link To Document