DocumentCode :
597593
Title :
Conduction mechanism of single-electron transistors fabricated by field-emission-induced electromigration
Author :
Akimoto, S. ; Suda, Ryutaro ; Ito, Minora ; Ando, Makoto ; Shirakashi, J.
Author_Institution :
Dept. of Electr. & Electron. Eng., Tokyo Univ. of Agric. & Technol., Koganei, Japan
fYear :
2013
fDate :
2-4 Jan. 2013
Firstpage :
211
Lastpage :
214
Abstract :
We report the conduction mechanism of the single-electron transistors (SETs) fabricated by field-emission-induced electromigration, which is so-called “activation”. By applying the activation to Ni nanogaps, we were easily able to fabricate the SETs operating at room temperature. Additionally, strong Coulomb staircases were clearly obtained, and the quasi-periodic current oscillations were also observed at room temperature. These results indicate that the higher charging energy associated with a smaller Ni island structure within the multiple islands causes a bottleneck mechanism in conduction, improving the Coulomb staircase structures.
Keywords :
Coulomb blockade; electromigration; single electron transistors; Coulomb staircase structure; Ni; SET; conduction mechanism; field emission induced electromigration; quasiperiodic current oscillations; single electron transistors; temperature 293 K to 298 K; Electrodes; Nickel; Oscillators; Single electron transistors; Temperature; Temperature measurement; Voltage measurement; Coulomb blockade and single-electron transistor; electromigration; field emission current; nanogap;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2013 IEEE 5th International
Conference_Location :
Singapore
ISSN :
2159-3523
Print_ISBN :
978-1-4673-4840-9
Electronic_ISBN :
2159-3523
Type :
conf
DOI :
10.1109/INEC.2013.6466001
Filename :
6466001
Link To Document :
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