DocumentCode :
598363
Title :
Fast switching and small sized SOI-LTIGBT with shorted trench anode
Author :
Qiang Fu ; Bo Zhang ; Zhaoji Li
Author_Institution :
State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
fYear :
2012
fDate :
Oct. 29 2012-Nov. 1 2012
Firstpage :
1
Lastpage :
3
Abstract :
In this paper a novel lateral trench insulated-gate bipolar transistor with shorted trench anode (STA -LTIGBT) on Silicon-on-insulator (SOI) is proposed and discussed. Its main features of the proposed structure are the deep oxide trench in drift region and the trench anode design. Hence the proposed structure could reduce drastically the total chip area not only in the drift region but also in anode region. Numerical simulation results indicate that the proposed STA -LTIGBT structure could suppress the snapback effect commendably. Furthermore, it is shown that the turnoff time of the proposed structure is decreased by 84% compared to that of the conventional LTIGBT, and by 70% compared to that of the deep trench LTIGBT.
Keywords :
insulated gate bipolar transistors; isolation technology; numerical analysis; silicon-on-insulator; STA -LTIGBT; deep oxide trench; drift region; fast switching; lateral trench insulated-gate bipolar transistor; numerical simulation; shorted trench anode; silicon-on-insulator; small sized SOI-LTIGBT; snapback effect; trench anode design; turnoff time; Anodes; Doping; Immune system; Insulated gate bipolar transistors; Numerical simulation; Silicon on insulator technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2012 IEEE 11th International Conference on
Conference_Location :
Xi´an
Print_ISBN :
978-1-4673-2474-8
Type :
conf
DOI :
10.1109/ICSICT.2012.6467739
Filename :
6467739
Link To Document :
بازگشت