Morphology and structural properties of nano-PZT thin films deposited on unheated substrate by RF sputtering system

Morphology and structure of lead zirconate ceramics thin films (PZT) target were investigated. They were deposited on unheated Aluminum (Al) and silicon (Si) substrates, and then heat-treated in a tabular furnace at 200 and 400°C during 30 min in air atmosphere. Its crystallographic characteristics were determined by glancing incidences X-ray diffraction (GIXRD) analysis with Fe Ka radiation (λ=1.936A ) at glancing angle of 1.5°.the micrographs of the surfaces and cross-sections of thin films were observed by using scanning electron microscopy SEM (Zeiss ultra plus) in Ultra-High resolution imaging. x-ray diffraction analysis showed that as-deposited PZT films, independently of the substrate nature, presents an amorphous structure and nano-crystallizes in a pure perovskite phase PbZr0.44Ti0.56O3 when it was only deposited on Al substrate and then thermal treated at relatively low temperature 400°C.