Title :
Modeling of a collisional triple frequency capacitively coupled plasma sheath
Author :
Rahman, M.T. ; Dewan, M.N.A. ; Chowdhury, M.R.H.
Author_Institution :
Dept. of Electr. & Electron. Eng., Bangladesh Univ. of Eng. & Technol., Dhaka, Bangladesh
Abstract :
A self-consistent analytical model for a high voltage, capacitively coupled plasma (CCP) sheath driven by three sinusoidal radio frequency (RF) current sources of different frequencies is proposed. In this model it is assumed that ion motion in the sheath is time independent and collisional. To describe the behavior of the sheath, analytical expressions for important sheath parameters have been developed. These parameters calculated using some standard values of plasma parameters are then compared with a collisional dual frequency and single frequency capacitively coupled sheath model.
Keywords :
plasma applications; plasma sheaths; CCP sheath; RF current sources; collisional dual frequency capacitively coupled sheath model; collisional triple frequency capacitively coupled plasma sheath; ion motion; single frequency capacitively coupled sheath model; sinusoidal radiofrequency current sources; Analytical models; Electric fields; Electric potential; Electrodes; Hafnium; Plasmas; Radio frequency; Capacitively coupled plasma; Collisional sheath; RF sheath; Triple frequency;
Conference_Titel :
Electrical & Computer Engineering (ICECE), 2012 7th International Conference on
Conference_Location :
Dhaka
Print_ISBN :
978-1-4673-1434-3
DOI :
10.1109/ICECE.2012.6471652