Title :
Periodic sub-wavelength surface-relief structures for antireflection
Author :
Gu, Xingfa ; Liu, Wenxin ; Zhang, Wensheng ; Zhang, Fang ; Yuan, Lei ; Wang, Y.Y. ; Peng, C.S.
Author_Institution :
Inst. of Inf. Opt. Eng., Soochow Univ., Suzhou, China
fDate :
Aug. 29 2012-Sept. 1 2012
Abstract :
Periodic sub-wavelength nanocones were simulated for antireflection with three different heights: 300, 500 and 700 nm on Si substrate. On the top of nanocones, we add a layer of Ni and SiO2 with the thicknesses of 10 nm, 20 nm and 30 nm. The reflective characteristics of nanostructures with or without nanomasks were studied by rigorous coupled-wave analysis (RCWA).
Keywords :
antireflection coatings; masks; nanostructured materials; nickel; silicon; silicon compounds; Ni; RCWA; Si; SiO2; antireflection surfaces; nanomasks; nanostructures; periodic subwavelength nanocones; periodic subwavelength surface relief structures; rigorous coupled wave analysis; size 10 nm; size 20 nm; size 30 nm; size 300 nm; size 500 nm; size 700 nm; Nanostructures; Nickel; Optical surface waves; Periodic structures; Reflectivity; Silicon; Substrates; RCWA; etching masks; reflective characteristics; sub-wavelength nanocones;
Conference_Titel :
Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2012 International Conference on
Conference_Location :
Shaanxi
Print_ISBN :
978-1-4673-4588-0
Electronic_ISBN :
978-1-4673-4589-7
DOI :
10.1109/3M-NANO.2012.6472953
