• DocumentCode
    60239
  • Title

    Experimental Evidence Toward Understanding Charge Pumping Signals in 3-D Devices With Poly-Si Channel

  • Author

    Baojun Tang ; Weidong Zhang ; Toledano-Luque, Maria ; Jian Fu Zhang ; Degraeve, Robin ; Zhigang Ji ; Arreghini, Antonio ; Van den bosch, Geert ; Van Houdt, Jan

  • Author_Institution
    Sch. of Eng., Liverpool John Moores Univ., Liverpool, UK
  • Volume
    61
  • Issue
    5
  • fYear
    2014
  • fDate
    May-14
  • Firstpage
    1501
  • Lastpage
    1507
  • Abstract
    Poly-Si (p-Si) channel used in 3-D Flash memory devices is the main source of degraded performance, such as the high interface state density. Charge pumping (CP) signals in the 3-D nanoscale vertical device with p-Si channel are analyzed in this paper using the variable amplitude CP technique. For the first time, it has been demonstrated experimentally that the broad CP edge is due to the threshold voltage variation in the p-Si channel caused by both the trapping in interface states and the source/drain p-n junction diffusion, and their impacts can be separately evaluated. Hot carrier stress in the tunneling FET operation modes and statistical analysis are used to provide supporting evidence.
  • Keywords
    elemental semiconductors; field effect transistors; flash memories; interface states; nanoelectronics; p-n junctions; silicon; statistical analysis; three-dimensional integrated circuits; tunnel transistors; 3D flash memory devices; 3D nanoscale vertical device; CP signals; Si; charge pumping signals; high interface state density; hot carrier stress; polysilicon channel; source-drain p-n junction diffusion; statistical analysis; threshold voltage variation; tunneling FET operation modes; variable amplitude CP technique; Charge carrier processes; Doping; Interface states; Junctions; Stress; Tunneling; 3-D; charge pumping (CP); doping profile; interface states; poly silicon (p-Si) channel; statistical variations; tunneling FET (TFET); tunneling FET (TFET).;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2014.2313038
  • Filename
    6782311