• DocumentCode
    602782
  • Title

    Low cycle fatigue crack initiation and propagation behavior of copper thin films used in electronic devices

  • Author

    Kambayashi, Takashi ; Sakane, M. ; Hirohata, K.

  • Author_Institution
    Dept. of Mech. Enginnering, Ritsumeikan Univ., Kusatsu, Japan
  • fYear
    2012
  • fDate
    10-12 Dec. 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    This paper presents the crack initiation and propagation behavior in 4-point bending low cycle fatigue for four kinds of copper thin films used in electronic devices at room and 353K. There was a distinct difference in cycles to crack depending on the fabrication process but not on surface roughness. The crack propagation rates depended on the fabrication process of the films but surface roughness. Raising the testing temperature accelealeted cycle to crack and cracks propagation rate.
  • Keywords
    bending; copper; fatigue cracks; fracture mechanics; mechanical testing; metallic thin films; Cu; bending; copper thin films; crack testing; fatigue crack initiation; fatigue crack propagation; surface roughness; temperature 293 K to 298 K; temperature 353 K;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    CPMT Symposium Japan, 2012 2nd IEEE
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-1-4673-2654-4
  • Type

    conf

  • DOI
    10.1109/ICSJ.2012.6523425
  • Filename
    6523425