DocumentCode :
602818
Title :
Silicon nanowires integrated in a fully depleted CMOS process for charge based biosensing
Author :
Jayakumar, G. ; Asadollahi, A. ; Hellstrom, Per-Erik ; Garidis, K. ; Ostling, Mikael
Author_Institution :
Sch. of ICT, KTH R. Inst. of Technol., Kista, Sweden
fYear :
2013
fDate :
19-21 March 2013
Firstpage :
81
Lastpage :
84
Abstract :
We describe a silicon nanowire (SiNW) biosensor fabricated in a fully depleted SOI CMOS process. The sensor array consists of 32 by 32 pixel matrix (1024 pixels or test sites) and 8 input-output (I/O) pins. In each pixel single crystalline SiNW with 60 by 20 nm cross-section area is defined using sidewall transfer lithography (STL) in the SOI layer. The key advantage of the design is that 1024 individual SiNWs can be read-out sequentially and used for real-time charge based detection of molecules in liquids or gases.
Keywords :
CMOS integrated circuits; biosensors; nanolithography; sensor arrays; silicon-on-insulator; SOl CMOS process; SOl layer; STL; charge based biosensing; cross-section area; fully depleted CMOS process; input-output pins; molecule real-time charge based detection; sensor array; sidewall transfer lithography; silicon nanowires; Biosensors; CMOS integrated circuits; Ions; Nickel; Silicides; Threshold voltage; CMOS; SOI; STL; biosensing; nanowire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration on Silicon (ULIS), 2013 14th International Conference on
Conference_Location :
Coventry
Print_ISBN :
978-1-4673-4800-3
Electronic_ISBN :
978-1-4673-4801-0
Type :
conf
DOI :
10.1109/ULIS.2013.6523496
Filename :
6523496
Link To Document :
بازگشت