DocumentCode
605490
Title
A 32kb 90nm 9T-cell sub-threshold SRAM with improved read and write SNM
Author
Zamani, Mahdi ; Hassanzadeh, S. ; Hajsadeghi, Khosrow ; Saeidi, Rahim
Author_Institution
Dept. of Electr. Eng., Sharif Univ. of Technol., Tehran, Iran
fYear
2013
fDate
26-28 March 2013
Firstpage
104
Lastpage
107
Abstract
The fast growth of battery operated devices has made low power SRAM designs a necessity in recent years. Moreover, embedded SRAM units have become an important block in modern SoCs. The SRAM performance is limited by the cell stability during different operation. By adding extra transistor to the conventional 6T-cell, hold, read and write static noise margin (SNM) can be improved in the sub-threshold SRAM. In this paper we proposed a new 9T-cell SRAM that shows 80% and 50% improvement in read and write SNM respectively in comparison to the conventional 6T-cell SRAM. Using stack transistors in the leakage current path, the new structure shows lower bitline leakage assisting the sense amplifier to easily read the bitline current. The 0.3V sub-threshold SRAM post-layout simulation using 90nm TSMC CMOS model confirms the proposed 32k SRAM performance.
Keywords
CMOS integrated circuits; SRAM chips; embedded systems; integrated circuit layout; leakage currents; low-power electronics; system-on-chip; 9T-cell sub-threshold SRAM; SRAM performance; SRAM post-layout simulation; SoC; TSMC CMOS model; battery operated devices; bitline current; bitline leakage; cell stability; embedded SRAM units; extra transistor; leakage current path; low power SRAM designs; memory size 32 KByte; read and write SNM; sense amplifier; size 90 nm; stack transistors; static noise margin; subthreshold SRAM; voltage 0.3 V; CMOS integrated circuits; Periodic structures; Random access memory; Semiconductor device modeling; SRAM; Stability; Static Noise Margin; Sub-threshold;
fLanguage
English
Publisher
ieee
Conference_Titel
Design & Technology of Integrated Systems in Nanoscale Era (DTIS), 2013 8th International Conference on
Conference_Location
Abu Dhabi
Print_ISBN
978-1-4673-6039-5
Electronic_ISBN
978-1-4673-6038-8
Type
conf
DOI
10.1109/DTIS.2013.6527787
Filename
6527787
Link To Document