• DocumentCode
    608226
  • Title

    Reliability of graphene interconnects and n-type doping of carbon nanotube transistors

  • Author

    Liyanage, L.S. ; Xiangyu Chen ; Hai Wei ; Hong-Yu Chen ; Mitra, Subhasish ; Wong, H.-S Philip

  • Author_Institution
    Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
  • fYear
    2013
  • fDate
    14-18 April 2013
  • Abstract
    Graphene and carbon nanotubes (CNTs) have gained significant attention due to their potential applications in high performance electronics. In order to replace or integrate the current silicon based technology with carbon based electronics one should study the reliability of those devices to understand the feasibility of their applications. In this report we present the reliability of CVD synthesized graphene for transistor interconnects and also investigate the reliability of a metal-oxide based CNT doping technique that is an active area of research in the current CNT community.
  • Keywords
    carbon nanotubes; chemical vapour deposition; graphene; interconnections; semiconductor device reliability; semiconductor doping; transistors; CNT community; CVD synthesized graphene reliability; carbon based electronics; carbon nanotube transistors; graphene interconnects; high performance electronics; metal-oxide based CNT doping technique; n-type doping; silicon based technology; transistor interconnects; Current density; Doping; Electric breakdown; Graphene; Reliability; Stress; Wires; Graphene; carbon nanotube; life-time; reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2013 IEEE International
  • Conference_Location
    Anaheim, CA
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4799-0112-8
  • Electronic_ISBN
    1541-7026
  • Type

    conf

  • DOI
    10.1109/IRPS.2013.6532045
  • Filename
    6532045