DocumentCode
608226
Title
Reliability of graphene interconnects and n-type doping of carbon nanotube transistors
Author
Liyanage, L.S. ; Xiangyu Chen ; Hai Wei ; Hong-Yu Chen ; Mitra, Subhasish ; Wong, H.-S Philip
Author_Institution
Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
fYear
2013
fDate
14-18 April 2013
Abstract
Graphene and carbon nanotubes (CNTs) have gained significant attention due to their potential applications in high performance electronics. In order to replace or integrate the current silicon based technology with carbon based electronics one should study the reliability of those devices to understand the feasibility of their applications. In this report we present the reliability of CVD synthesized graphene for transistor interconnects and also investigate the reliability of a metal-oxide based CNT doping technique that is an active area of research in the current CNT community.
Keywords
carbon nanotubes; chemical vapour deposition; graphene; interconnections; semiconductor device reliability; semiconductor doping; transistors; CNT community; CVD synthesized graphene reliability; carbon based electronics; carbon nanotube transistors; graphene interconnects; high performance electronics; metal-oxide based CNT doping technique; n-type doping; silicon based technology; transistor interconnects; Current density; Doping; Electric breakdown; Graphene; Reliability; Stress; Wires; Graphene; carbon nanotube; life-time; reliability;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium (IRPS), 2013 IEEE International
Conference_Location
Anaheim, CA
ISSN
1541-7026
Print_ISBN
978-1-4799-0112-8
Electronic_ISBN
1541-7026
Type
conf
DOI
10.1109/IRPS.2013.6532045
Filename
6532045
Link To Document